Impurity Doping Processes in Silicon

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Franklin F. Y. Wang
North-Holland Publishing Company, Jan 1, 1981 - Semiconductor doping - 643 pages
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This book introduces to non-experts several important processes of impurity doping in silicon and goes on to discuss the methods of determination of the concentration of dopants in silicon. The conventional method used is the discussion process, but, since it has been sufficiently covered in many texts, this work describes the double-diffusion method.

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Contents

Contents
3
DOUBLEDIFFUSION PROCESSES IN SILICON
4
Interactions between dopants during double diffusion
10
Copyright

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